NAIST-ÉCOLE POLYTECHNIQUE

International Collaborative Laboratory for

Energy Materials

Facilities and Equipments

Information Device Science Laboratory

Material formation

  • Magnetron sputtering
  • PECVD
  • Plasma-assisted ALD
  • Electron beam evaporator
  • Spin-coating (in cleanroom / in glovebox)
  • Thermal evaporator

Simulation tools

  • ATLAS, ATHENA (SILVACO Inc.)
  • COMSOL Multiphysics (COMSOL Inc.)
  • FullWAVE BandSOLVE DiffractMOD (Rsoft design)

Process methods

  • Photolithography
  • Nanoimprint lithography
  • Anneal furnace
  • Sintering oven
  • Screen-printing
  • Gloveboxes
  • Inkjet printing machine
  • Clean-room (class 10,000, area: 200 m2)
  • Clean-rooms of the institute (large clean-room: class 1,000, area: 230 m2, yellow-room: class 100, area: 20 m2, clean-room for bio-nano process: class 1,000, area: 100 m2)

Structural analyses

  • XPS
  • Secondary Ion Mass Spectroscopy
  • AFM
  • TEM
  • SEM
  • XRD
  • Profiler

Optical analyses

  • Photoluminescence
  • FT-IR spectroscopy
  • Ellipsometry
  • Raman spectroscopy
  • Emission microscope

PElectrical properties

  • Semiconductor analyzer
  • C-V meter
  • Hall effect measuremen

LPICM

Synthesis and deposition Equipment

  • Plasma Enhanced Chemical Vapour Deposition (PECVD) sources (microwave, tailored waveforms)
  • Low temperature epitaxy
  • Chemical laboratories
  • Thermal evaporators: for metallorganohalide perovskite, for OLED and OPV processes (8 different evaporation sources, co-evaporation of two different materials, four positions for shadow-masks allowing fabricating several devices during the same process without breaking the vacuum, for OTFTs, equipped with 4 different evaporation sources (2 for organic materials and 2 for metals), for metallic electrodes.
  • Wet deposition: spincoater (in- and outside of glove-box), first generation ink-jet printer, "doctor blade" system
  • CVD reactors dedicated to carbon nanotubes and semiconductor nanowires synthesis.

Optical equipment

  • Spectroscopic ellipsometry
  • Spectrophotocolorimeter (PR-655 from Photoresearch) coupled with a homemade IVL measurement system (in DC or pulsed current), integrating sphere for photoluminiscent and electroluminiscent characterization
  • Mueller polarimetry
  • Raman spectroscopy “nano-Raman”, Tip Enhanced Raman Spectroscopy
  • Photoluminescence (PL)

Electrical characterization

  • Solar simulator calibrated to AM 1.5 coupled to an I(V) characterization system under a controlled atmosphere
  • A probe station coupled to a 4200 semiconductor parameter analyzer (Keithley 4200) and an impedance analyzer (Agilent 4192) for electrical characterization under inert ambient.
  • Electroluminescence (EL)

Material characterization

  • Glow discharge mass spectrometry
  • Advanced plasma characterization techniques (corona discharge probe) and in-situ materials characterization thanks to in-house developed techniques (spectroscopic ellipsometry, …)
  • SEM
  • TEM
  • AFM/EFM
  • RAMAN spectroscopy.
  • SAFEM facility